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Product Description
Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.
About the Author
McGraw-Hill authors represent the leading experts in their fields and are dedicated to improving the lives, careers, and interests of readers worldwide
Thin film deposition is a broad and burgeoning field, with applications ranging from razor blade coatings to quantum-well lasers. However, much of the available thin film literature is based on empirical knowledge, and focuses only on specific processes or applications. This volume rectifies that situation, offering a complete description od the theory and technology of thin film deposition. The book's broad perspective gives readers the tools to objectively evaluate and choose the appropriate thin film process for a specific application. This indispensable volume also includes a complete list of symbols and an extensive index.
About the Author
McGraw-Hill authors represent the leading experts in their fields and are dedicated to improving the lives, careers, and interests of readers worldwide
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Inside This Book
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First Sentence:
Thin films are deposited onto bulk materials (substrates) to achieve properties unattainable or not easily attainable in the substrates alone. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
macroparticle ejection, arriving vapor, quenched growth, impingement flux, electron energy gain, depositing vapor, film conformality, axisymmetric reactor, sheath voltage drop, sheath width, subsurface effects, arrival flux, film being deposited, native point defects, depositing film, sheath field, depositing species, surface diffusion length, driven electrode, flux monitoring, sputtered particles, fractional surface coverage, cathode sheath, film purity, bombardment energy Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Molecular Beam Epitaxy, Academic Press, Park Ridge, Plasma Processing, Noyes Publications, Thin Solid Films, John Wiley, Boca Raton, Materials Research Society, Pergamon Press, American Chemical Society, Frequency Effects, Plasma Science, Handbook of Metal Etchants, Physics Res, Tables of Chemical Thermodynamic, Thermochemical Tables New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Thin films are deposited onto bulk materials (substrates) to achieve properties unattainable or not easily attainable in the substrates alone. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
macroparticle ejection, arriving vapor, quenched growth, impingement flux, electron energy gain, depositing vapor, film conformality, axisymmetric reactor, sheath voltage drop, sheath width, subsurface effects, arrival flux, film being deposited, native point defects, depositing film, sheath field, depositing species, surface diffusion length, driven electrode, flux monitoring, sputtered particles, fractional surface coverage, cathode sheath, film purity, bombardment energy Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Molecular Beam Epitaxy, Academic Press, Park Ridge, Plasma Processing, Noyes Publications, Thin Solid Films, John Wiley, Boca Raton, Materials Research Society, Pergamon Press, American Chemical Society, Frequency Effects, Plasma Science, Handbook of Metal Etchants, Physics Res, Tables of Chemical Thermodynamic, Thermochemical Tables New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 47
books:
See all 47 books this book cites
8
books
cite this book:
See all 8 books citing this book
- Chemical Vapor Deposition (06682G) by Jong-Hee Park on page 366, page 452, and page 556
- Handbook of Thin Film Technology (McGraw-Hill Handbooks) by Leon I. Maissel on page 34, and page 218
- The Feynman Lectures on Physics: Commemorative Issue, Three Volume Set by Richard P. Feynman on page 450, and page 554
- Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18) by Maurice H. Francombe on page 556, and page 587
- Dislocations in Solids : Volume 11 by F. R. N. Nabarro on page 306
See all 47 books this book cites
- Industrial Plasma Engineering: Applications (Industrial Plasma Engineering, Vol 2) (v. 2) by J Reece Roth on 4 pages
- Semiconductor Nanostructures for Optoelectronic Applications (Artech House Semiconductor Materials and Devices Library) by Todd D. Steiner on page 226
- Nanoengineering of Structural, Functional and Smart Materials by Mark J. Schulz on page 155
- Thin Film Technology Handbook by Aicha Eishabini-Riad on page 38
- Specimen Handling, Preparation, and Treatments in Surface Characterization (Methods of Surface Characterization) by Alvin W. Czanderna in Back Matter
See all 8 books citing this book
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