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Editorial Reviews
Review
"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences."
--AUSTRALIAN PHYSICIST
[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
--SOCIETY OF VACUUM COATERS
Review
"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences."
--AUSTRALIAN PHYSICIST
[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
--SOCIETY OF VACUUM COATERS
See all Editorial Reviews
"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences."
--AUSTRALIAN PHYSICIST
[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
--SOCIETY OF VACUUM COATERS
Review
"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences."
--AUSTRALIAN PHYSICIST
[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
--SOCIETY OF VACUUM COATERS
See all Editorial Reviews
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Inside This Book Citations: This book cites 47 books | 24 books that cite this book Explore: Citations | Books on Related Topics | Concordance | Text Stats Key Phrases - SIPs: plasma flux analysis, partial pressure analysis, plasma ion density, magnetic sheath, single wafer systems (more) Key Phrases - CAPs: New York, New Jersey, Kenneth Herb, Extended Abstracts, Academic Press (more) Browse Sample Pages: Front Cover | Copyright | Table of Contents | Excerpt | Index | Back Cover | Surprise Me! |
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Inside This Book
(learn more)
First Sentence:
The rapid development of plasma etching technology was stimulated by its application to the manufacture of microelectronic devices. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
plasma flux analysis, partial pressure analysis, plasma ion density, magnetic sheath, single wafer systems,
The rapid development of plasma etching technology was stimulated by its application to the manufacture of microelectronic devices. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
plasma flux analysis, partial pressure analysis, plasma ion density, magnetic sheath, single wafer systems,