Thin Film Processes (Hardcover)

by John L. Vossen (Editor), Werner Kern (Editor) "The processes selected for review fall into the same four general categories as in the volume [1]: (1) physical methods of film deposition, (2) chemical..." (more)
Key Phrases: plasma excitation region, reduced temperature processing, plasma generation region, New York, Thin Solid Films, Academic Press (more...)

Editorial Reviews

Review
"The editors are to be commended for producing an excellent text that should prove to be as popular as their first volume published over 20 years ago."
--George H. Sigel, Jr. in OPTICS & PHOTONICS NEWS
"The book is a welcome addition to the growing library of edited books on deposition processes."
--SOCIETY OF VACUUM COATERS
"This book does a good job of examining film deposition and etching from the process viewpoint. Explanations of basic processes and their various parameters are clearly presented, and the reader is left with a feeling of what is and is not well understood about each process. This approach, coupled with extensive references to the general literature, should make this book valuable to both beginning and advanced reseachers in the field....In short, this book should be a worthy addition to the library of anyone working in the field of thin films."
--APPLIED OPTICS
"The book will be welcomed by those who may wish to gain a broad perspective on a particular process or the techniques generally available, as well as by the specialist using such processes....The book provides an interesting juxtaposition of relatively well established procedures with quite recent and still developing techniques; it will certainly be a useful book to have around."
--VACUUM
"As a status report of technology in the preparation of electronic materials, it can serve both as a reference for those within the field and an introduction to those with related interest."
--JOURNAL OF METALS
"For those currently in the field of thin film research, this book would be an excellent appraisal and current reference tome. For the entering scientist, it would be a good source book and a quick study for present research."
--JOURNAL OF THE ELECTROCHEMICAL SOCIETY
"This book is a valuable addition to the library of the physicist, chemist, or engineer who desires to broaden his knowledge of coating processes."
--THE AUSTRALIAN PHYSICIST -- Review --This text refers to the Hardcover edition.

Review
"The editors are to be commended for producing an excellent text that should prove to be as popular as their first volume published over 20 years ago."
--George H. Sigel, Jr. in OPTICS & PHOTONICS NEWS
"The book is a welcome addition to the growing library of edited books on deposition processes."
--SOCIETY OF VACUUM COATERS
"This book does a good job of examining film deposition and etching from the process viewpoint. Explanations of basic processes and their various parameters are clearly presented, and the reader is left with a feeling of what is and is not well understood about each process. This approach, coupled with extensive references to the general literature, should make this book valuable to both beginning and advanced reseachers in the field....In short, this book should be a worthy addition to the library of anyone working in the field of thin films."
--APPLIED OPTICS
"The book will be welcomed by those who may wish to gain a broad perspective on a particular process or the techniques generally available, as well as by the specialist using such processes....The book provides an interesting juxtaposition of relatively well established procedures with quite recent and still developing techniques; it will certainly be a useful book to have around."
--VACUUM
"As a status report of technology in the preparation of electronic materials, it can serve both as a reference for those within the field and an introduction to those with related interest."
--JOURNAL OF METALS
"For those currently in the field of thin film research, this book would be an excellent appraisal and current reference tome. For the entering scientist, it would be a good source book and a quick study for present research."
--JOURNAL OF THE ELECTROCHEMICAL SOCIETY
"This book is a valuable addition to the library of the physicist, chemist, or engineer who desires to broaden his knowledge of coating processes."
--THE AUSTRALIAN PHYSICIST --This text refers to the Hardcover edition.

See all Editorial Reviews

Product Details

• Hardcover: 564 pages
• Publisher: Academic Press (1978)
• Language: English
• ISBN-10: 0127282505
• ISBN-13: 978-0127282503
• Product Dimensions: 8.9 x 6.2 x 1.3 inches
• Shipping Weight: 1.8 pounds
• Average Customer Review: 3.0 out of 5 stars See all reviews (1 customer review)
• Amazon.com Sales Rank: #662,512 in Books (See Bestsellers in Books)

Customer Reviews

Most Helpful Customer Reviews

4 of 5 people found the following review helpful:

3.0 out of 5 stars Not as comprehensive as I had hoped..., July 14, 2001

By	jcnabity (USA) - See all my reviews

This review is from: Thin Film Processes, Volume 2 (Pt. 2) (Hardcover)

The book's jacket claims that it was written to "stand alone" as a "comprehensive introduction." While it does go into depth on many advanced topics, I thought it did not give enough detail on the basics to qualify as a "comprehensive introduction" to thin film processes.