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In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.
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Citations
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cite this book:
- Direct Write Technologies for Rapid Prototyping Applications: In Sensors, Electronics and Integrated Power Sources by Alberto Pique on page 413
- Laser Processing of Engineering Materials: Principles, Procedure and Industrial Application by John Ion on page 217
- Intermetallic and Ceramic Coatings (Materials Engineering, 13) by Narnedra B. Dahotre in Back Matter
- Aerosol Processing of Materials by Toivo T. Kodas on page 228
- Chemistry of Advanced Materials: An Overview (Chemistry of Advanced Materials) by Leonard V. Interrante on page 204
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