Review
The authors present a good blend of applications and theory by including many graphs for specific materials along with generalized theory.
- IEEE Electrical Insulation Magazine, Nov/Dec 2004, Vol. 20, No. 6
Product Description
Physical Properties of Thin Metal Films provides a clear presentation of the complex physical properties particular to thin conducting films and includes the necessary theory, confirming experiments and applications. The volume will be an invaluable reference for graduates, engineers and scientists working in the electronics industry and fields of pure and applied science.
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Inside This Book
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First Sentence:
Let us consider the basic electro-physical characteristics of metal and other conducting films that are important for their practical application. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
tunnelling emission, electromigration immunity, thermal electron emission, internal mechanical stresses, large grain films, electromigration damage, third harmonic amplitude, aluminium films, mirror parameter, bismuth films, molybdenum films, diffusion origin, chromium films, conductivity fluctuations, mobile defects, cantilever substrate, thin fihns, island films, excess vacancies, frequency exponent, void density, resistance fluctuations, electron wind, electromigration resistance, reduced resistivity Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Academic Press, Physics of Thin Films, Quantum Electron, Radio Eng, Solid State Physics New!
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Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Let us consider the basic electro-physical characteristics of metal and other conducting films that are important for their practical application. Read the first page Key Phrases - Statistically Improbable Phrases (SIPs): (learn more)
tunnelling emission, electromigration immunity, thermal electron emission, internal mechanical stresses, large grain films, electromigration damage, third harmonic amplitude, aluminium films, mirror parameter, bismuth films, molybdenum films, diffusion origin, chromium films, conductivity fluctuations, mobile defects, cantilever substrate, thin fihns, island films, excess vacancies, frequency exponent, void density, resistance fluctuations, electron wind, electromigration resistance, reduced resistivity Key Phrases - Capitalized Phrases (CAPs): (learn more)
New York, Academic Press, Physics of Thin Films, Quantum Electron, Radio Eng, Solid State Physics New!
Books on Related Topics | Concordance | Text Stats Browse Sample Pages:
Front Cover | Table of Contents | First Pages | Index | Back Cover | Surprise Me!
Citations (learn more)
This book cites 19
books:
See all 19 books this book cites
- Plasma Sources for Thin Film Deposition and Etching (Physics of Thin Films Volume 18) by Maurice H. Francombe on 4 pages
- Solid State Physics: Advances in Research and Applications, Vol. 32 by Henry Ehrenreich on page 33, page 79, and page 162
- Introduction to Solid State Physics by Charles Kittel on page 33, page 79, and page 162
- Handbook of Thin Film Technology (McGraw-Hill Handbooks) by Leon I. Maissel on page 34, and page 80
- Theory of Dislocations by John Price Hirth on page 162
See all 19 books this book cites
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