Glow Discharge Processes: Sputtering and Plasma Etching (Hardcover)

~ Brian Chapman (Author) "In all the plasma processes discussed in this book, namely deposition and etching by physical sputtering and by plasma enhanced chemistry, the gaseous environment plays..." (more)
Key Phrases: bias evaporation, sputter ejection, hot filament discharge, New York, Academic Press, Solid State Tech (more...)

Editorial Reviews

Product Description

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications—practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

From the Publisher

Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Product Details

• Hardcover: 432 pages
• Publisher: Wiley-Interscience; 1 edition (September 11, 1980)
• Language: English
• ISBN-10: 047107828X
• ISBN-13: 978-0471078289
• Product Dimensions: 9.5 x 6.1 x 1.3 inches
• Shipping Weight: 1.8 pounds (View shipping rates and policies)
• Average Customer Review: 3.7 out of 5 stars  See all reviews (3 customer reviews)
• Amazon.com Sales Rank: #969,438 in Books (See Bestsellers in Books)

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Customer Reviews

Most Helpful Customer Reviews

5 of 5 people found the following review helpful:

4.0 out of 5 stars Good introductory book, too expensive, May 6, 1999

By A Customer

This is the ideal book for beginning students attempting to navigate the maze of plasma physics for the first time. The book concentrates on developing an intuitive feel for ionized gases while including enough real physics to back up the intuition with numbers. It's unfortunate that the publisher has priced this work out of the range of the average student for whom it would be so useful.

3 of 3 people found the following review helpful:

3.0 out of 5 stars Mixed feelings, July 15, 2001

By	Steven Marks "Prog Harpo" (Petaluma, CA United States) - See all my reviews (REAL NAME)

I wholeheartly recomend this book to someone just starting out in plasma processing. It is THE best introductory book on the subject.

However, if you have read the literature and have been exposed to the subject for a while, you will find that the book is very basic and a little outdated. Chapman used to be the VP of Technology for a Plasma Etch firm when he wrote the 1st edition. Now he is (and has for some time been) President of a vacuumn diagnostics company. He really has not been updating this. With that caveat, if the other books/literature is "over your head" - go to this book for simply to understand explanations of so called "low temperature" plasma phenemena.

3 of 3 people found the following review helpful:

4.0 out of 5 stars Great fundamental reference, August 22, 2000

By	"rteal6" (PA) - See all my reviews

While the specifics of various systems is dated, this is a great reference for the basics of plasma processing. Even though the equipment I use today is significantly more advanced I continually refer to this work for baseline information. The explanations are clear and well written. A rare example of a reference / textbook one can actually read.