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Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology (Materials Science and Process Technology Series. Electronic Materials and Process Technology)
 
 
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Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology (Materials Science and Process Technology Series. Electronic Materials and Process Technology) (Hardcover)

by Rointan F. Bunshah (Editor) "Historically, from the late 1950sonward, decorative coatingsoraluminum provided the initial thrustfor surface-engineered products fortoys, textiles, etc..." (more)
Key Phrases: detonation gun coatings, surface kinetics control, atomistic deposition processes, New York, Academic Press, Metal Finishing (more...)
4.0 out of 5 stars  (1 customer review)

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Editorial Reviews
Review

". ..a useful addition..."-Adv. Mater. "...a unique collection of current knowledge. . ,,- Technische Rundschau. an invaluable reference..."-Optics & Photonics News.



Product Description

A decade after the first edition of this volume was published, this second edition is being brought out partly due to the excellent response to the first edition, and also to update the many improvements in deposition technologies, the mechanisms, and applications.

The entire volume has been extensively revised and contains 50% or more new material. Five entirely new chapters have been added. The organization of the book has also been changed in the following respects: (1) Considerably more material has been added in Plasma Assisted Vapor Deposition Processes; and (2) A new chapter on Metallurgical Coating Applications has been added.

Selected subjects include:

1. Definitions and concepts
2. Classification of coating processes
3. Unique features of deposited materials
4. Current applications
5. Frontier areas
6. Selection criteria
7. Plasma spraying and detonation gun techniques
8. Volume and surface reactions
9. Cleaning processes
10. Environmental control
11. Storage and handling
12. Surface modification
13. Passivation and preservation
14. Safety
15. Evaporation processes and apparatus
16. Sputter deposition techniques
17. Bombardment effects
18. Reactive ion plating
19. Nucleation
20. Selective deposition
21. Reactor influence on plasma behavior
22. Plasma-assisted techniques
23. Electrodeposition
24. Film growth


Product Details
  • Hardcover: 835 pages
  • Publisher: Noyes Publications; 2 Sub edition (February 1, 1994)
  • Language: English
  • ISBN-10: 0815513372
  • ISBN-13: 978-0815513377
  • Product Dimensions: 9.6 x 6.5 x 1.9 inches
  • Shipping Weight: 3.3 pounds (View shipping rates and policies)
  • Average Customer Review: 4.0 out of 5 stars  (1 customer review)
  • Amazon.com Sales Rank: #267,824 in Books (See Bestsellers in Books)

    Popular in these categories: (What's this?)

    #7 in  Books > Professional & Technical > Engineering > Chemical > Coatings, Ceramics & Glass
    #84 in  Books > Professional & Technical > Engineering > Chemical > Materials
    #89 in  Books > Professional & Technical > Engineering > Materials > Metallurgy

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