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Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics, Vol 2)
  
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Modeling of Chemical Vapor Deposition of Tungsten Films (Progress in Numerical Simulation for Microelectronics, Vol 2) (Hardcover)

by Chris R. Kleijn (Author), Christoph Werner (Author)
5.0 out of 5 stars  (1 customer review)

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Product Details
  • Hardcover: 126 pages
  • Publisher: Birkhauser (March 25, 1993)
  • Language: English
  • ISBN-10: 0817628584
  • ISBN-13: 978-0817628581
  • Product Dimensions: 9.2 x 6.2 x 0.8 inches
  • Shipping Weight: 12 ounces
  • Average Customer Review: 5.0 out of 5 stars  (1 customer review)
  • Amazon.com Sales Rank: #5,740,368 in Books (See Bestsellers in Books)
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  • Also Available in: Hardcover  |  All Editions

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