- Hardcover: 432 pages
- Publisher: Wiley-Interscience; 1 edition (September 25, 1980)
- Language: English
- ISBN-10: 047107828X
- ISBN-13: 978-0471078289
- Product Dimensions: 6.4 x 1.3 x 9.5 inches
- Shipping Weight: 1.8 pounds (View shipping rates and policies)
- Average Customer Review: 3 customer reviews
- Amazon Best Sellers Rank: #744,248 in Books (See Top 100 in Books)
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Glow Discharge Processes: Sputtering and Plasma Etching 1st Edition
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From the Publisher
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
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However, if you have read the literature and have been exposed to the subject for a while, you will find that the book is very basic and a little outdated. Chapman used to be the VP of Technology for a Plasma Etch firm when he wrote the 1st edition. Now he is (and has for some time been) President of a vacuumn diagnostics company. He really has not been updating this. With that caveat, if the other books/literature is "over your head" - go to this book for simply to understand explanations of so called "low temperature" plasma phenemena.