- Hardcover: 396 pages
- Publisher: Wiley-VCH; 2nd, Revised and Extended edition (October 15, 2004)
- Language: English
- ISBN-10: 3527404104
- ISBN-13: 978-3527404100
- Product Dimensions: 6.9 x 1 x 9.6 inches
- Shipping Weight: 1.8 pounds (View shipping rates and policies)
- Average Customer Review: Be the first to review this item
- Amazon Best Sellers Rank: #3,102,278 in Books (See Top 100 in Books)
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The Physics and Technology of Ion Sources 2nd, Revised and Extended Edition
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From the Back Cover
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
About the Author
Ian Brown is a Senior Physicist at the Lawrence Berkeley national Laboratory, Berkeley, California. His research interests include the development of plasma and ion sources and their application for materials synthesis and modification. In 1984 he established the Plasma Applications Group at the Berkeley Laboratory and was Group Leader there until his retirement in 2001. He maintains an interest in ongoing research and is actively involved in a number of collaborative research programs; his work on vacuum arc ion sources and materials surface modification has won several awards.
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