- Series: Plasma -- Materials Interactions
- Hardcover: 476 pages
- Publisher: Academic Press; 1 edition (August 11, 1989)
- Language: English
- ISBN-10: 0124693709
- ISBN-13: 978-0124693708
- Product Dimensions: 6 x 1.1 x 9 inches
- Shipping Weight: 2 pounds (View shipping rates and policies)
- Average Customer Review: Be the first to review this item
- Amazon Best Sellers Rank: #803,122 in Books (See Top 100 in Books)
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Plasma Etching: An Introduction (Plasma -- Materials Interactions) 1st Edition
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"The subject matter is therefore well tuned to the needs of workers in the semiconductor industry, although it would also serve as an excellent textbook for a final undergraduate year or postgraduate course on the processing of semiconductor materials. This book is strongly recommended for the libraries of all universities and research laboratories working in the physical sciences."
[The authors] have produced a comprehensive and very readable book that will be especially valuable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH, Section B: Beam Interactions with Materials and Atoms
...They have produced a comprehensive and very readable book that will be especially vauable to the scientist or engineer just entering the field. The emphasis is clearly on understanding fundamental phenomena rather than specific recipes, thus its utility will outlive the present generation of processes and equipment.
--Thomas M. Mayer
SANDIA NATIONAL LABORATORIES
Good discussions of plasma chemistry, plasma diagnostics and handling hazardous gases used in plasmas.
--SOCIETY OF VACUUM COATERS
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