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Principles of Plasma Discharges and Materials Processing 1st Edition

4.2 out of 5 stars 5 customer reviews
ISBN-13: 978-0471005773
ISBN-10: 0471005770
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From the Publisher

Systematically treats the basics of plasma physics and chemistry in partially ionized, chemically reactive, low-pressure plasmas. Offers an understanding of the wide diversity of plasma discharges and procedures used in thin film processing applications, as in the fabrication of integrated circuits. Includes scores of worked examples and exercises.

About the Author

MICHAEL A. LIEBERMAN, PhD, is Professor of Electrical Engineering at the University of California, Berkeley, and Director of the Berkeley Electronics Research Laboratory. He has published more than 140 journal articles on the topics of plasmas, plasma processing, and nonlinear dynamics. He has also published, with Professor Lichtenberg, Regular and Stochastic Motion and Regular and Chaotic Dynamics, Second Edition. ALLAN J. LICHTENBERG, PhD, is Professor of Electrical Engineering at the University of California, Berkeley. A respected pioneer in the fields of high-temperature plasmas, plasma discharges, and nonlinear dynamics, Dr. Lichtenberg has written over 100 articles in these areas. In addition to the books coauthored with Professor Lieberman, he has written an earlier monograph Phase Space Dynamics of Particles.
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Product Details

  • Hardcover: 600 pages
  • Publisher: Wiley-Interscience; 1 edition (October 28, 1994)
  • Language: English
  • ISBN-10: 0471005770
  • ISBN-13: 978-0471005773
  • Product Dimensions: 6.5 x 1.5 x 9.6 inches
  • Shipping Weight: 2.3 pounds
  • Average Customer Review: 4.2 out of 5 stars  See all reviews (5 customer reviews)
  • Amazon Best Sellers Rank: #1,699,510 in Books (See Top 100 in Books)

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Top Customer Reviews

As a praciticing process engineer my opinion is this book lacks insight. Typical text book written a professor in the academic community with no practical experience. This book spends far to much time deriving equations and not discussing the basics concepts. The author makes a half hearted attempt to relate the first 14 chapters to the real worl, in a short and inadequate Chapter 15. This is the first mail book order book i took the time to return. In all honesty this book is not worth the $90.00. Spend your money elsewhere
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Good introductory book on plasma processes, especially for applications in semiconductor fabrication. Good for the fundamental principles and theory. I would choose other books for description of the process, equipment, etc.
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Lieberman covers many of the standard processing devices and much of the physics needed to model them effectively.
The presentation is clear and extremely useful both as a reference and as a tutorial. A must-have book for anyone interested in plasma processing.
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This book provides an excellent introduction and overview of plasma discharges applied to semiconductor manufacturing. It is well-organized, clearly-written and full of useful examples and exercises. And unlike many books on plasma physics, it is not overly-mathematical and contains many useful physical insights. I strongly recommend this book for anyone wanting to review the field of plasma processing.
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This book provides a theoretical overview of plasma's, including coverage of ECR applications. This was very valuable for Hitachi Etchers. The theory is presented at an undergraduate level and assumes the reader has knowledge of vector analysis. Highly recommended for any Etch Process Engineer in the Semiconductor Industry.
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