- Paperback: 770 pages
- Publisher: Cambridge University Press; 1 edition (January 19, 2009)
- Language: English
- ISBN-10: 0521529778
- ISBN-13: 978-0521529778
- Product Dimensions: 6.8 x 1.5 x 9.7 inches
- Shipping Weight: 3.3 pounds (View shipping rates and policies)
- Average Customer Review: 5 customer reviews
- Amazon Best Sellers Rank: #686,704 in Books (See Top 100 in Books)
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Thin Film Materials: Stress, Defect Formation and Surface Evolution 1st Edition
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'The book is a landmark in a rich subject which has seen many developments over the past decade. In addition to being beautifully written, the book contains many illustrations, micrographs, and problems for students. The book will serve as a graduate text, as well as a comprehensive monograph everyone working in the field will want to own.' Professor John W. Hutchinson, Harvard University
'Freund and Suresh have written a masterpiece on thin film materials that will become a classic reference for this newly developed field. Their book provides an organized and beautifully written exposition of the subject of thin film mechanical behavior. For the first time there is a single starting point for the field. The book brings together materials and mechanics aspects of thin films effortlessly, reflecting the authors' expertise in joining these fields of science and engineering.' Professor William D. Nix, Stanford University
'I would heartily recommend this book as an essential read for anyone working in any area of thin film deposition.' Materials World
'Thin Film Materials will prove a valuable resource. It contains a wealth of useful references and good indexes. It is richly illustrated, and there are good exercises after each chapter. For a graduate course in the field, it will be hard to beat. And if the authors are right, there will be a growing demand for such courses.' The Times Higher Education Supplement
Thin films play an important role in many technological applications which include: microelectronic devices, magnetic storage media and surface coatings. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation and surface evolution in thin films. Of particular interest to engineers, materials scientists and physicists, it provides a balanced coverage of theory, experiment and simulation. Highly illustrated and containing numerous homework problems, this book will be essential reading on senior undergraduate and graduate courses on thin films.
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Virtually, all properties of thin films (electronic, magnetic, optical, ferroelecrtic, multiferroic etc.) are affected if not chiefly governed by the elastic coupling of "order" parameters with strains and such, especially at nanoscopic length scales. This book is primarily devoted to mechanical behavior of thin films in an isolated fashion. For instance, misfit dislocation and critical thickness phenomena in thin films is treated with linear elasticity models, so much so that it is of limited use in thin films of multifunctional materials (ferromagnetics, ferroelectics, ferroelastics, multiferroics etc). However, the book by Freund and Suresh is an excellent introductory text from a mechanical behavior perspective. It develops all core concepts efficiently and thoroughly. And as such, it is of fundamental importance. I highly recommend it.